PURPOSE: To extremely easily and economically produce a monosilane by treating dichlorosilane in the presence of a catalyst at a specific reaction temperature using a specific reaction method.
CONSTITUTION: A catalyst (e.g., polymeric sulfonic acid amine salt catalyst) is filled in a vertical reaction tube and a dichlorosilane is introduced into the reaction tube at a part filled with the catalyst or below the filled part to effect the disproportionation reaction of the dichlorosilane at a temperature below the boiling point of the dichlorosilane and above the boiling point of monosilane. The conosilane is taken out of the reaction tube from a part above the filled part and the trichlorosilane and tetrachlorosilane are discharged from a part below the filled part. The objective monosilane can be produced by the above process with single reaction apparatus using an extremely simple means at a concentration considerably higher than at least the equilibrium composition of dichlorosilane. The concentration of the produced monosilane is nearly 100%.
| WO/2016/027743 | METHOD FOR PRODUCING OLIGOSILANE |
| JPS56121629 | FILM FORMING METHOD |
| JP4664913 | Purification of hydride gas for semiconductor industry |
MIYAGAWA HIROJI
YANAGAWA NORIYUKI
ABE TAKAHARU
ITO MASAYOSHI
