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Patent Searching and Data


Title:
SPUTTERING DEVICE
Document Type and Number:
Japanese Patent JPH0790569
Kind Code:
A
Abstract:

PURPOSE: To prepare a high-quality film by arranging a second shutter between a target and a substrate.

CONSTITUTION: A substrate supporting jig 25 is set in a vacuum chamber 24. A movable first shutter 227 is arranged between the target 29 and substrate 26 as electrodes. A second shutter 27 has a hole smaller than the diameter of the target 29 and the first shutter 227, and at least the surface on the substrate 26 side consists of the same material as the target 29. The second shutter 27 is arranged between the target 29 and the first shutter 227 and/or between the shutter 227 and the substrate 26. Consequently, the frequency of periodic maintenance due to the stripping of film, etc., is remarkably reduced.


Inventors:
ICHIKAWA TAKESHI
Application Number:
JP1993000232882
Publication Date:
April 04, 1995
Filing Date:
September 20, 1993
Export Citation:
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Assignee:
CANON KK
International Classes:
C23C14/34; H01L21/203; H01L21/285; (IPC1-7): C23C14/34; H01L21/203; H01L21/285
Attorney, Agent or Firm:
若林 忠