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Title:
SPUTTERING TARGET MADE OF INTERMETALLIC COMPOUND DISPERSED TYPE SINTERED ALUMINUM ALLOY
Document Type and Number:
Japanese Patent JPH09249966
Kind Code:
A
Abstract:

To provide a sputtering target made of an intermetallic compound dispersed type sintered Al allay for forming reflective film or the wiring of liquid crystal TFT used for optical media such as optical disks executing the recording and erasing of information using optical beam.

The surface of a sputtering target 1 made of an intermetallic compound dispersed type sintered Al alloy has a compsn. contg. one or more kinds among the intermetallic compounds of Al and Ta, the intermetallic compounds of Al and Zr, the intermetallic compounds of At and Ti, the intermetallic compounds of Al and Hf, the intermetallic compounds of Al and Nb, the intermetallic compounds of Al and Cr, the intermetallic compounds of Al and W and the intermetallic compounds of Al and Mo by 2.0 to 60mol%, and the balance Al with inevitable impurities, and these intermetallic compounds are reduced by the concn. gradient of 0.02 to 2.0mol%/mm in the thickness direction to the back face 3 from the surface 2 of the sputtering target 1.


Inventors:
FUKUI SOICHI
Application Number:
JP1996000056162
Publication Date:
September 22, 1997
Filing Date:
March 13, 1996
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
C22C1/04; C22C21/00; C23C14/34; G11B7/24; G11B7/258; G11B7/26; (IPC1-7): C23C14/34; C22C1/04; C22C21/00; G11B7/24; G11B7/26
Attorney, Agent or Firm:
Kazuo Tomita (1 person outside)