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Title:
STATIONARY PLATING DEVICE
Document Type and Number:
Japanese Patent JPH0741995
Kind Code:
A
Abstract:

PURPOSE: To suppress the variation in plating thickness and to improve maintainability by vertically moving and oscillating a material to be plated opposed to an insoluble anode in a plating tank and jetting a plating soln. into the plating tank.

CONSTITUTION: A material 1 to be plated is received by a clawlike receiving jig in a plating tank 8, and a cathode 4 is pressed on the material 1 by means of a rotating and oscillating actuator 6. Meanwhile, a plus electrode 15 is totally formed with an insoluble anode 10 opposed to the cathode 4 and a plating material 11 (solder, etc.) in a standby tank 9. The plating soln. in the standby tank 9 is always cleaned by a filter 12, injected into the plating tank 8 by a pump through an injection nozzle 16 and circulated to the standby tank 9. The material 1 is plated by this constitution, hence the variation in plating thickness is suppressed, and maintainability is improved.


Inventors:
HATAYAMA KIYOTAKA
Application Number:
JP8207391A
Publication Date:
February 10, 1995
Filing Date:
January 21, 1991
Export Citation:
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Assignee:
MIZUSAWA SEMICONDUCTOR KK
International Classes:
C25D17/00; C25D17/06; C25D17/10; C25D21/10; C25D21/14; C25D21/18; (IPC1-7): C25D17/00; C25D17/06; C25D17/10; C25D21/10; C25D21/14; C25D21/18
Domestic Patent References:
JPS5821391A1983-02-08
JPS5713193A1982-01-23
JPS5293637A1977-08-06