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Patent Searching and Data


Title:
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
Document Type and Number:
Japanese Patent JP2021064701
Kind Code:
A
Abstract:
To provide a substrate cleaning device and a substrate cleaning method that can more reliably clean the peripheral edge of a substrate.SOLUTION: A substrate cleaning device includes: a substrate rotating unit 110 that rotates a substrate W; a peripheral edge cleaning member 10 that cleans the peripheral edge portion of the substrate W; a peripheral edge rotating unit 40 that rotates the peripheral edge cleaning member 10 around a peripheral edge rotating shaft 19 extending in a direction orthogonal to a substrate rotating shaft 130; moving units 31 and 36 that move the position of the peripheral edge cleaning member 10 with respect to the peripheral edge portion of the substrate W; and a control unit 50 that moves the position of the peripheral edge cleaning member 10 with respect to the peripheral edge portion of the substrate W by controlling the moving units 31 and 36, and cleans a one side peripheral edge region W1 including the one side surface of the peripheral edge portion of the substrate W, a side surface region W3 including the side surface, and another side peripheral edge region W2 including another side surface, by the peripheral cleaning member 10.SELECTED DRAWING: Figure 3

Inventors:
OIKAWA FUMITOSHI
FUJIMOTO TOMOAKI
MIYAZAKI MITSURU
FUKAYA KOICHI
Application Number:
JP2019188424A
Publication Date:
April 22, 2021
Filing Date:
October 15, 2019
Export Citation:
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Assignee:
EBARA CORP
International Classes:
H01L21/304
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Hiroyuki Ohno
Koji Morita
Osamu Tsuda
Matsuno Chihiro
Seiichi Sakitani
Hiroshi Nomoto