To provide a substrate processing apparatus that can obtain a high throughput by improving transport efficiency.
An inspection block which inspects a development-processed substrate is incorporated in the substrate processing apparatus which performs a resist applying process and development process. In the inspection block, an inspection unit which performs inspections of a prescribed content and a transport robot which receives and delivers the substrate from and to the inspection unit are loaded. When a substrate to be inspected is carried in the inspection block, the transport robot carries the substrate to the inspection unit. When a substrate not to be inspected is carried in the inspection block, the transport robot carries the substrate to the outlet of the block as it is. In this case, it is permitted that a succeeding substrate not to be inspected gets ahead of a preceding substrate to be inspected in the inspection block.
HAJIKI KENJI
KOYAMA YASUFUMI
Yoshitake Hidetoshi
Takahiro Arita