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Patent Searching and Data


Title:
SUPPLYING METHOD FOR CHEMICAL
Document Type and Number:
Japanese Patent JPH0637080
Kind Code:
A
Abstract:

PURPOSE: To obtain a method for supplying chemical of a high purity by removing influence of impurity ions contained in the chemical by utilizing an existing high purity gas supply system.

CONSTITUTION: High purity gas 1 in a gas cylinder 9 to become a chemicals material is introduced into a chemicals treating tank 4 for a semiconductor substrate filled with ultrapure water 3 by bubbling through a high purity gas supply line 2, and chemicals 5 of aqueous solution of the gas 1 prepared to a predetermined concentration is prepared. The chemicals 5 of a predetermined concentration is obtained by introducing a measuring probe 7 of a concentration meter or a pH meter 6 into the water 3, switching a solenoid valve 8 of the line 2 in cooperation with the concentration meter or the meter 6 and regulating bubbling amount of the gas 1 to the wafer 3.


Inventors:
SAKAMOTO NAOKI
Application Number:
JP1992000185578
Publication Date:
February 10, 1994
Filing Date:
July 14, 1992
Export Citation:
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Assignee:
FUJITSU LTD
KYUSHU FUJITSU ELECTRONIC
International Classes:
B08B3/04; H01L21/304; (IPC1-7): H01L21/304; B08B3/04
Attorney, Agent or Firm:
井桁 貞一