Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
SURFACE TREATMENT AND APPARATUS THEREFOR
Document Type and Number:
Japanese Patent JPH01233727
Kind Code:
A
Abstract:

PURPOSE: To shorten the time for a surface treatment of an object to be treated by a method wherein active oxygen obtained by irradiating ultraviolet rays onto nitrous oxide gas is supplied to the surface of the object to be treated and a prescribed surface treatment is executed in order to dissociate active oxygen O (1D) of high concentration.

CONSTITUTION: A wafer 6 is placed on the surface of a wafer stage 5; the stage 5 is started to turn. When a valve 11 of a nitrous oxide gas supply source 2 is opened, nitrous oxide gas is introduced into a treatment chamber 1 through a pipe 3 and is diffused to the whole surface of the wafer 6 through a slight gap between the surface of the stage 5 and a glass sheet 8. An excitation reaction is caused by ultraviolet rays radiated from a lamp 9, and active oxygen 0 (1D) of high concentration is dissociated; accordingly, a resist which has been applied to the surface of the wafer 6 is oxidized and decomposed quickly to a volatile low molecule such as CO2, H2O, N2 or the like. By this setup, the time for a surface treatment of an object to be treated, i.e. the water 6, can be shortened.


Inventors:
OOSAKATANI TAKAYOSHI
NISHITANI EISUKE
Application Number:
JP6171988A
Publication Date:
September 19, 1989
Filing Date:
March 14, 1988
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI LTD
International Classes:
G03F7/30; G03C11/00; G03F7/00; G03F7/42; H01L21/027; H01L21/30; H01L21/302; H01L21/3065; (IPC1-7): G03C11/00; G03F7/00; H01L21/30; H01L21/302
Domestic Patent References:
JPS6043824A1985-03-08
JPH01157528A1989-06-20