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Patent Searching and Data


Title:
PHOTOMASK
Document Type and Number:
Japanese Patent JPH0677204
Kind Code:
A
Abstract:

PURPOSE: To obtain a highly precise photomask in which the initial resist dimensions are reflected with fidelity.

CONSTITUTION: A treatment substrate 1 and a light-shielding pattern 10, which is formed on the transparent substrate 1, are provided. The light-shielding pattern 10 is formed by a laminated layer film wherein at least two types of films 6 and 7 are laminated. The two types of films 6 and 7 are formed by the material which can be etched independently using different etchants.


Inventors:
AOYAMA SATORU
Application Number:
JP22562792A
Publication Date:
March 18, 1994
Filing Date:
August 25, 1992
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
H01L21/306; (IPC1-7): H01L21/306
Attorney, Agent or Firm:
Fukami Hisaro (3 outside)