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Title:
CORRECTION SOLUTION FOR USE IN ELECTROPHOTOGRAPHIC OFFSET MASTER PLATE AND CORRECTION METHOD USING IT
Document Type and Number:
Japanese Patent JPS5850550
Kind Code:
A
Abstract:

PURPOSE: To obtain a correction soln. for use in an electrophotographic offset master plate superior in printing resistance of an erased part, by using the soln. contg. a polymer consisting of (meth) acrylic acid, maleic acid, or itaconic acid monomer units, and aliphatic carboxylic acid, and aliphatic alcohol.

CONSTITUTION: A correction soln. contains (A) 0.2W30wt% polymer consisting mainly of monomer units of at least one of acrylic acid, methacrylic acid, maleic acid, and itaconic acid; (B) 0.2W30wt% aliphatic carboxylic acid; (C) 40W 95wt% aliphatic alcohol; (D) 1W50wt% water; and when needed, (E) 0.1W20wt% fluorine-contg. surfactant as main components. The component (A) is preferably in 10,000W500,000mol.wt. range, and in the case of copolymer, the content of monomer units of at least one of said acids is preferably ≥50mol% of the total monomer units.


Inventors:
IKEGAMI SHINPEI
OOSAWA SADAO
SAKAGUCHI SHINJI
Application Number:
JP14908081A
Publication Date:
March 25, 1983
Filing Date:
September 21, 1981
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03G13/28; B41N3/08; (IPC1-7): G03G13/26