To provide a transparent base material with an antireflection film which is excellent in strength, adhesion, flexibility, bending property or the like and by which optical characteristics and electrical characteristics such as antistatic property and electrical conductivity can be given while suppressing reflected light inequality.
The transparent base material 10 with the antireflection film is characterized by being provided with the antireflection film 5 which is constituted by successively laminating a first layer 2 having refractive index difference of ≤0.5 from the transparent base material 1 and thickness between 30 nm and 180 nm, a second layer 3 having refractive index difference between 0.02 and 0.5 from the transparent base material 1 and thickness between 0.03μm and 10μm and a third layer 4 having refractive index difference between 0.1 and 0.4 from the transparent base material 1 and thickness between 50 nm and 150 nm on one main surface 1a of the transparent base material 1.
WAKABAYASHI ATSUMI
KISHIMOTO ATSUSHI
HORIGUCHI HISAAKI
KATOU HIROTSUGU
KUGIMOTO HIROKUNI
MARUYAMA HIROSHI
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama