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Title:
TRANSPARENT RESIN, PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JPH10171120
Kind Code:
A
Abstract:

To obtain a resin having excellent transparency for short wavelength light and high durability against dry etching by incorporating a photoacid producing agent and such oligomers that have at least either an alicyclic skeleton or a conjugate polycondensation aromatic skeleton in the main chain and that the main chain can be decomposed or hydrolyzed with acid.

The compsn. contains a photoacid producing agent and such oligomers that have at least either an alicyclic skeleton or a conjugate polycondensation aromatic skeleton and that the main chain can be decomposed or hydrolyzed with acid. The alicyclic skeleton included in the main chain of the oligomers is a cyclic cyclocompd. expressed by CnH2n, wherein n is an integer ≥3 or a cyclic bicycle or tricycle compd., or a condensed ring of these. The conjugate polycyclic condensed aromatic skeleton in the oligomers, for example, is a compd. having a naphthalene ring or anthracene ring, and especially a conjugate polycyclic condensed aromatic skeleton such as a naphthalene ring and anthracene ring is preferably used.


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Inventors:
GOKOCHI TORU
ASAKAWA KOUJI
OKINO TAKASHI
SHINODA NAOMI
NAKASE MAKOTO
HAYASE RUMIKO
KAWAMONZEN YOSHIHIRO
Application Number:
JP1997000272534
Publication Date:
June 26, 1998
Filing Date:
October 06, 1997
Export Citation:
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Assignee:
TOSHIBA CORP
International Classes:
G03F7/038; C08G18/34; C08G63/12; C08G69/26; C08L67/00; C08L77/06; G03F7/039; H01L21/027; (IPC1-7): G03F7/038; C08G18/34; C08G63/12; C08G69/26; C08L67/00; C08L77/06; G03F7/039; H01L21/027
Attorney, Agent or Firm:
鈴江 武彦 (外6名)