Title:
TREATMENT DEVICE AND CLEANING METHOD FOR COMPONENT THEREOF
Document Type and Number:
Japanese Patent JP2003068653
Kind Code:
A
Abstract:
To provide a cleaning method for component, with which generation of particle can be suppressed through improving the surface state by cleaning the surface of a component composed of specified materials of a treatment device in an etchant, after working.
In the cleaning method for components 22 and 26 of a treatment apparatus 20 for applying treatment to a workpiece W to be treated, the surface of the component is cleaned by treating the surface of the component in the etchant. Thus, a damaged layer formed on the surface of each of components is removed by cleaning, and the strength of sticking to an unwanted film stuck on this surface is enhanced.
Inventors:
MIYAGAWA NOBORU
WAKABAYASHI SATORU
WAKABAYASHI SATORU
Application Number:
JP2001255264A
Publication Date:
March 07, 2003
Filing Date:
August 24, 2001
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
B08B7/02; B08B3/08; C23C16/44; H01J37/32; H01L21/205; (IPC1-7): H01L21/205; B08B3/08; B08B7/02
Domestic Patent References:
| JPH06220600A | 1994-08-09 | |||
| JPH1157636A | 1999-03-02 | |||
| JP2000303180A | 2000-10-31 | |||
| JPH05263281A | 1993-10-12 | |||
| JPH118216A | 1999-01-12 |
Attorney, Agent or Firm:
Akihiro Asai
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