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Patent Searching and Data


Title:
VERY THIN WIRE OF COPPER ALLOY FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPH04184946
Kind Code:
A
Abstract:

PURPOSE: To prevent contact or sag of a copper wire in the case of a fine pitch and long loop, and improve reliability, by using a copper allay very thin wire of a specified composition.

CONSTITUTION: A copper alloy very thin wire for semiconductor which wire contains Ir of 0.1-50wt.ppm, impurities less than or equal to 5wt.ppm, and copper as the remainder is used as a bonding wire. Further a thin wire composed of the following is used as a bonding wire; Ir of 0.1-50ppm, inevitable impurities less than or equal to 5ppm, one kind or two or more kinds of elements of total amount 0.1ppm-0.5% which elements are selected out of the element group of Be, Cr, Sn, Zn, Zr, Ag, Mg, Ca, rare earth elements, Ti, Hf, V, Nb, Ta, Ni, Pd, Pt, Au, Cd, B, In, Si, Ge, Pb, P, Sb and Bi, and copper as the remainder. Thereby elasticity is increased, and work-hardening in the case of bonding becomes hard to be generated.


Inventors:
ISHII TOSHINORI
MORI TAMOTSU
Application Number:
JP31467790A
Publication Date:
July 01, 1992
Filing Date:
November 20, 1990
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
H01L21/60; (IPC1-7): H01L21/60
Attorney, Agent or Firm:
Masatake Shiga (2 outside)