VISIBLE LIGHT PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION

Title:

VISIBLE LIGHT PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION

Document Type and Number:

Japanese Patent JP2005320338

Kind Code:

A

Abstract:

To provide a composition having sufficient sensitivity to visible light region, especially the 2nd harmonics of argon laser and YAG laser and forming excellent photosensitive layer for visible light lasers.

The visible light photosensitive resin composition comprises a coumarin compound represented by a compound of formula(44) and a titanocene compound.

Inventors:

SUZUKI RIHOKO
OTSUJI ATSUO
URAGAMI TATSUNOBU
TAKUMA HIROSUKE

Application Number:

JP2005148984A

Publication Date:

November 17, 2005

Filing Date:

May 23, 2005

Export Citation:

Click for automatic bibliography generation Help

Assignee:

MITSUI CHEMICALS INC

International Classes:

G03F7/004; C07D405/06; C07D413/06; C07D417/06; C07D491/052; C07D491/16; C08F2/50; G03F7/029; (IPC1-7): C07D405/06; C07D413/06; C07D417/06; C07D491/052; C07D491/16; C08F2/50; G03F7/004; G03F7/029

Previous Patent: METHOD AND COMPOSITION FOR CELLULAR REPROGRAMMING

Next Patent: MODIFIED TGF-β-SUPERFAMILY PROTEIN