Title:
WASTE GAS TREATMENT EQUIPMENT
Document Type and Number:
Japanese Patent JP2003130327
Kind Code:
A
Abstract:
To improve the decomposition efficiency of fluorine compound included in exhaust gas exhausted from a semiconductor manufacturing process.
After exhaust gas which removes silica powder generated by burning silane in the gas including the fluorine compound and the silane exhausted from the semiconductor manufacturing process is preheated in one accumulator 27a, it is burnt. Other accumulator 27b is heated by the burnt exhaust gas. The fluorine compound is decomposed by an alternating combustion method changing one accumulator and the other accumulator alternately. Water or steam which is excessive than stoichiometric ratio requiring for decomposing the fluorine compound is added to the exhaust gas which removes the silica powder.
Inventors:
TAKARAYAMA NOBORU
HANAYAMA FUMIHIKO
KUMAGAI KENJI
NOMURA SHINICHIRO
KATSUTA YASUTSUNE
HANAYAMA FUMIHIKO
KUMAGAI KENJI
NOMURA SHINICHIRO
KATSUTA YASUTSUNE
Application Number:
JP2001328773A
Publication Date:
May 08, 2003
Filing Date:
October 26, 2001
Export Citation:
Assignee:
BABCOCK HITACHI KK
International Classes:
F23L15/02; B01D53/46; B01D53/68; B01D53/70; F23G7/06; F23J15/00; H01L21/205; (IPC1-7): F23G7/06; F23J15/00; F23L15/02; H01L21/205
Attorney, Agent or Firm:
Hirotsugu Yoshioka