Title:
簡略化された光学素子を備えた極端紫外線（ＥＵＶ）基板検査システム及びその製造方法
Document Type and Number:
Japanese Patent JP6522604
Kind Code:
B2
Abstract:
An extreme ultraviolet (EUV) substrate inspection system and method of manufacturing thereof, includes: an EUV source directing EUV illumination through an aperture; a light detector detecting mask illumination with reduced off axis rays reflected off from a substrate; and a computing device processing image data detected by the light detector.
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Inventors:
Foad Majeed A
Venture Christopher Dennis
Talbot Christopher Gee
Moran John Christopher
Venture Christopher Dennis
Talbot Christopher Gee
Moran John Christopher
Application Number:
JP2016524600A
Publication Date:
May 29, 2019
Filing Date:
December 18, 2014
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
G01N21/956
Domestic Patent References:
| JP2007221129A | ||||
| JP2012530902A | ||||
| JP2013019793A | ||||
| JP2012118304A | ||||
| JP8209527A | ||||
| JP4190145A |
Foreign References:
| US20130056642 | ||||
| US20120236281 | ||||
| US6555828 | ||||
| US6738135 | ||||
| US20130017475 | ||||
| US20120008123 | ||||
| US20130083321 | ||||
| US20080266547 |
Attorney, Agent or Firm:
Yoshiaki Anzai