PURPOSE: To obtain a method for supplying chemical of a high purity by removing influence of impurity ions contained in the chemical by utilizing an existing high purity gas supply system.
CONSTITUTION: High purity gas 1 in a gas cylinder 9 to become a chemicals material is introduced into a chemicals treating tank 4 for a semiconductor substrate filled with ultrapure water 3 by bubbling through a high purity gas supply line 2, and chemicals 5 of aqueous solution of the gas 1 prepared to a predetermined concentration is prepared. The chemicals 5 of a predetermined concentration is obtained by introducing a measuring probe 7 of a concentration meter or a pH meter 6 into the water 3, switching a solenoid valve 8 of the line 2 in cooperation with the concentration meter or the meter 6 and regulating bubbling amount of the gas 1 to the wafer 3.
WO/1999/046083 | CLEANING DEVICE FOR SURFACE PLATE CORRECTING DRESSER |
WO/2005/005063 | CLEANING AND DRYING A SUBSTRATE |
JP2518212 | [Name of invention] Centrifugal device |
KYUSHU FUJITSU ELECTRONIC