Title:
強制超薄膜回転式処理法を用いたナノ粒子の製造方法
Document Type and Number:
Japanese Patent JP4817154
Kind Code:
B2
Abstract:
The present invention provides a method for producing nanoparticles, which comprises maintaining a minute space of 1 mm or less between two processing surfaces capable of approaching to and separating from each other and being rotating relative to each other, allowing the minute space maintained between the two processing surfaces to serve as a flow path of a processed fluid thereby forming a forced thin film of the processed fluid and separating nanoparticles in the forced thin film.
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Inventors:
Shinichi Enomura
Application Number:
JP2009522636A
Publication Date:
November 16, 2011
Filing Date:
July 04, 2008
Export Citation:
Assignee:
M Technique Co., Ltd.
International Classes:
B01J19/00; B01F25/74; B02C7/14; B02C19/00; B22F1/054; B82B3/00
Domestic Patent References:
| JP2006247615A | 2006-09-21 | |||
| JPH08500289A | 1996-01-16 | |||
| JP2004049957A | 2004-02-19 | |||
| JP2006249380A | 2006-09-21 |
Attorney, Agent or Firm:
Takenobu Samejima