Title:
PRODUCTION METHOD OF POLYAMIDE RESIN AND PRODUCTION METHOD OF PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME
Document Type and Number:
Japanese Patent JP2017179364
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a simple production method of a polyamide resin having fewer chlorine ions, and a production method of a photosensitive resin composition using the polyamide resin.SOLUTION: The production method of a polyamide resin includes a step of allowing (A) an active carboxylic acid compound to react with (B) a diamine compound, in which the (A) active carboxylic acid compound has at least one of diimidazolide compound-based structures and the polyamide resin has an aliphatic group.SELECTED DRAWING: None
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Inventors:
TAKEYAMA HIROKI
MASUDA YUKI
SHOJI YU
MASUDA YUKI
SHOJI YU
Application Number:
JP2017058753A
Publication Date:
October 05, 2017
Filing Date:
March 24, 2017
Export Citation:
Assignee:
TORAY INDUSTRIES
International Classes:
C08G69/28; G03F7/004; G03F7/023; G03F7/20
Foreign References:
| WO2009031602A1 | 2009-03-12 | |||
| WO2016035593A1 | 2016-03-10 |
Other References:
JOURNAL OF POLYMER SCIENCE: POLYMER CHEMISTRY EDITION, 1973, VOL.11, P.1095-1105, JPN6020044979, ISSN: 0004516575
JOURNAL OF POLYMER SCIENCE: POLYMER CHEMISTRY EDITION, 1976, VOL.14, P.2665-2673, JPN6020044980, ISSN: 0004516576
JOURNAL OF POLYMER SCIENCE: POLYMER CHEMISTRY EDITION, 1977, VOL.15, P.2731-2737, JPN6020044981, ISSN: 0004516577
JOURNAL OF POLYMER SCIENCE: POLYMER CHEMISTRY EDITION, 1976, VOL.14, P.2665-2673, JPN6020044980, ISSN: 0004516576
JOURNAL OF POLYMER SCIENCE: POLYMER CHEMISTRY EDITION, 1977, VOL.15, P.2731-2737, JPN6020044981, ISSN: 0004516577
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