Title:
A method and a device for perceiving the substrate in a chamber
Document Type and Number:
Japanese Patent JP6017560
Kind Code:
B2
Abstract:
The present invention provides methods, apparatus, and systems of sensing a substrate in a chamber. The invention includes emitting radiation of at least two different wavelengths; directing the emitted radiation of a first wavelength through a view port of a chamber at an interior of the chamber; directing the emitted radiation of a second wavelength through the view port of the chamber at a location of a hole in a blade of a substrate carrier; detecting any of the emitted radiation reflected by the blade, the interior of the chamber, or a substrate on the blade; and determining if a substrate is present on the blade based on the reflected radiation detected. Numerous additional aspects are disclosed.
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Inventors:
Schauer Ronald Verne
Application Number:
JP2014526107A
Publication Date:
November 02, 2016
Filing Date:
August 10, 2012
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/67; G01V8/20
Domestic Patent References:
| JP10064971A | ||||
| JP2010535425A | ||||
| JP6107333A | ||||
| JP2004140147A | ||||
| JP4085730U | ||||
| JP6214046A | ||||
| JP2010225957A |
Foreign References:
| US6621092 | ||||
| US5820329 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo