Title:
シルセスキオキサン誘導体およびその製造方法
Document Type and Number:
Japanese Patent JP4379120
Kind Code:
B2
Abstract:
The present invention relates to a silsesquioxane derivative and a production process for the same. Commercially available silsesquioxane derivatives have only several kinds of fundamental skeletons and have had various problems resulting from an inferior compatibility with resins. The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The problems described above have been solved by this. The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is -O-,-CH2- or a single bond. The preferred organic group is a functional group or a group having a functional group.
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Inventors:
Yoshitaka Morimoto
Kenichi Watanabe
Shintake Ohtake
Junichi Inagaki
Kazuhiro Yoshida
Yasuchika Okuma
Kenichi Watanabe
Shintake Ohtake
Junichi Inagaki
Kazuhiro Yoshida
Yasuchika Okuma
Application Number:
JP2003528724A
Publication Date:
December 09, 2009
Filing Date:
September 17, 2002
Export Citation:
Assignee:
Chisso Co., Ltd.
International Classes:
C07F7/21; C08G77/04
Domestic Patent References:
| JP2067290A | ||||
| JP2000334881A | ||||
| JP2001048890A | ||||
| JP6329687A |