Title:
シルセスキオキサン誘導体およびその製造方法
Document Type and Number:
Japanese Patent JP4379120
Kind Code:
B2
Abstract:
The present invention relates to a silsesquioxane derivative and a production process for the same. Commercially available silsesquioxane derivatives have only several kinds of fundamental skeletons and have had various problems resulting from an inferior compatibility with resins. ?>The present inventors have obtained a PSQ derivative of a completely condensed type into which a functional group is readily introduced by using a novel PSQ derivative of an incompletely condensed type in which four alkaline metal atoms are bonded to silsesquioxane of a cage type having eight Si's. The problems described above have been solved by this. ?>The above silsesquioxane derivative is represented by Formula (1). A silsesquioxane derivative to which alkaline metal atoms are bonded is represented by Formula (2). In Formula (1) and Formula (2), R is a group selected from alkyl, aryl and arylalkyl; Y is a group represented by Formula (a) or Formula (b); and M is a monovalent alkaline metal atom. X in Formula (a) and Formula (b) is hydrogen, halogen, a hydroxyl group or a monovalent organic group, and Z is -O-,-CH2- or a single bond. The preferred organic group is a functional group or a group having a functional group.
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Inventors:
Yoshitaka Morimoto
Kenichi Watanabe
Shintake Ohtake
Junichi Inagaki
Kazuhiro Yoshida
Yasuchika Okuma
Kenichi Watanabe
Shintake Ohtake
Junichi Inagaki
Kazuhiro Yoshida
Yasuchika Okuma
Application Number:
JP2003528724A
Publication Date:
December 09, 2009
Filing Date:
September 17, 2002
Export Citation:
Assignee:
Chisso Co., Ltd.
International Classes:
C07F7/21; C08G77/04
Domestic Patent References:
JP2067290A | ||||
JP2000334881A | ||||
JP2001048890A | ||||
JP6329687A |