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Title:
The photosensitive resin composition containing a new alicyclic ester compound, an acrylics (meta) copolymer, and it
Document Type and Number:
Japanese Patent JP6274205
Kind Code:
B2
Abstract:
[Problem to be solved] The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance). [Means to solve the problem] A mixture of cycloaliphatic ester compounds represented by general formulae (1) to (3), and a process for preparation thereof, as well as a (meth)acrylic copolymer comprising the cycloaliphatic ester compounds of general formulae (1) to (3) and a photosensitive resin composition thereof.

Inventors:
早川 祥一
西村 喜男
古川 喜久夫
田中 博康
Application Number:
JP2015513772A
Publication Date:
February 07, 2018
Filing Date:
April 22, 2014
Export Citation:
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Assignee:
三菱瓦斯化学株式会社
International Classes:
C08F220/18; C07C67/26; C07C69/757; C08L33/14; G03F7/039; H01L21/027
Domestic Patent References:
JP2011123143A
JP2012128009A
Foreign References:
WO2012008546A1
Attorney, Agent or Firm:
小林 浩
杉山 共永
潮 太朗
鈴木 康仁