Title:
A plasma treatment apparatus and a plasma processing method
Document Type and Number:
Japanese Patent JP5909807
Kind Code:
B2
Inventors:
Tetsuya Goto
Application Number:
JP2015516943A
Publication Date:
April 27, 2016
Filing Date:
March 28, 2014
Export Citation:
Assignee:
Tohoku University
International Classes:
H05H1/46; C23C14/58; C23C16/511; H01L21/31; H01L21/316; H01L21/318; H05H3/02
Domestic Patent References:
| JPS60263434A | 1985-12-26 | |||
| JPS62291031A | 1987-12-17 | |||
| JPH02192720A | 1990-07-30 | |||
| JPH0227718A | 1990-01-30 | |||
| JPH0227718A | 1990-01-30 | |||
| JPH01238020A | 1989-09-22 | |||
| JPS62170475A | 1987-07-27 | |||
| JPH03132027A | 1991-06-05 | |||
| JPH0774112A | 1995-03-17 | |||
| JPH05198533A | 1993-08-06 | |||
| JPS60263434A | 1985-12-26 | |||
| JPS62291031A | 1987-12-17 | |||
| JPH02192720A | 1990-07-30 |
Other References:
JPN6014027028; 犬竹 正明: 'マイクロ波反射計とプローブ計測による密度および磁場揺動径方向分布の比較' 平成７年〜８年度科学研究費補助金（基盤研究（Ｂ）（２））研究成果報告書 , 199703, 第１-７３頁, 独立行政法人 日本学術振興会
Attorney, Agent or Firm:
Kenji Fujimoto
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