To provide a gas-liquid supply device capable of performing a stable processing with vaporized liquid and gas, and to provide a reforming device capable of stably performing a reforming processing of raw fuel gas with water vapor.

The gas-liquid supply device S supplies a liquid W and a gas G to a processing device E which is housed in a housing container 1, together with a heat generating section generating heat and heats and vaporizes the supplied liquid W by using heat generated in the heat generation section. A gas-liquid supplying pipe 4, inserted through the container 1 from outside and connected to the processing device E, is provided to make both the liquid W and the gas G flow to the processing device E. On an inside wall 4w of the gas-liquid supplying pipe 4, a mixed-phase flow section C is provided along a total pipe length, in a longitudinal direction from a supplying section 4e to the treatment device E to send the liquid W out of both the liquid W and the gas G to make it flow in a longitudinal direction of the pipe in adhesion to the inner wall 4w.

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