Title:
The resist lower layer film formation constituent containing copolymerization resin including heterocycle
Document Type and Number:
Japanese Patent JP6137486
Kind Code:
B2
Inventors:
Someya Yasunobu
Keisuke Hashimoto
Tetsuya Shinshiro
Nishimaki Hirokazu
Ryo Ezawa
Rikimaru Sakamoto
Keisuke Hashimoto
Tetsuya Shinshiro
Nishimaki Hirokazu
Ryo Ezawa
Rikimaru Sakamoto
Application Number:
JP2013556376A
Publication Date:
May 31, 2017
Filing Date:
January 25, 2013
Export Citation:
Assignee:
Nissan Chemical Industry Co., Ltd.
International Classes:
G03F7/11; C08G12/00; C08G14/00; C08G61/12; G03F7/26; G03F7/40; H01L21/027
Domestic Patent References:
| JP2007077138A | ||||
| JP2000169460A | ||||
| JP2007297540A | ||||
| JP2005128509A | ||||
| JP10152636A | ||||
| JP2012214720A |
Foreign References:
| WO2010147155A1 |
Attorney, Agent or Firm:
Calyx
Miyazaki Yoshio
Tsutomu Kato
Companion wisdom
Miyazaki Yoshio
Tsutomu Kato
Companion wisdom