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Title:
SCRATCH RESISTANT COATING EXHIBITING IMPROVED CLEANING PROPERTY, SUBSTRATE WITH SCRATCH RESISTANT COATING EXHIBITING IMPROVED CLEANING PROPERTY AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
Japanese Patent JP2017075090
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a substrate with a coating exhibiting improved cleaning property and for enhancing scratch property, and a manufacturing method therefor.SOLUTION: A substrate is provided with a coating which contains at least one high refractivity and transparent hard material layer and aluminum nitride, has contact angle to water of >75°, average roughness of <1.3 nm, preferably <1.2 nm and especially preferably <1 nm and/or roughness Rms of <2 nm, preferably <1.5 nm and especially preferably <1.3 nm and static friction coefficient of <0.3, preferably <0.24 and especially preferably <0.2 and/or sliding friction coefficient of <0.2, preferably <0.15 and especially preferably <0.12. A manufacturing method of the coating uses a magnetron sputtering method or a HiPIMS (high output impulse magnetron sputtering) method as a sputtering method.SELECTED DRAWING: Figure 4

Inventors:
CHRISTIAN HENN
FRANZISKA BACK
JOCHEN HERRMANN
Application Number:
JP2016194265A
Publication Date:
April 20, 2017
Filing Date:
September 30, 2016
Export Citation:
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Assignee:
SCHOTT AG
International Classes:
C03C17/22; C03C17/34; C23C14/06
Domestic Patent References:
JP2013043827A2013-03-04
JP2004202336A2004-07-22
JPH07237998A1995-09-12
JPH04349127A1992-12-03
JP2007248562A2007-09-27
Foreign References:
WO2014135490A12014-09-12
Other References:
K. AIT AISSA ET AL.: "Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron s", THIN SOLID FILMS, vol. 550, JPN6020036532, 21 November 2013 (2013-11-21), pages 264 - 267, ISSN: 0004668451
Attorney, Agent or Firm:
Einzel Felix-Reinhard
Junichi Maekawa
Hiroyasu Ninomiya
Ueshima