Title:
ACRYLIC ACID ESTER DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2012/105321
Kind Code:
A1
Abstract:
Provided is a photoresist composition which contains a polymer compound that contains, as a constituent unit, a specific methacrylic acid ester derivative. The photoresist composition is capable of forming a photoresist pattern that has improved LWR and high resolution. [Solution] An acrylic acid ester derivative which is represented by general formula (1). (In the formula, R1 represents a hydrogen atom or a methyl group; A represents a moiety represented by general formula (A-1) or (A-2); R2 and R3 each independently represents an alkyl group having 1-6 carbon atoms or a cyclic hydrocarbon group having 3-6 carbon atoms; Z represents CH2 or -O-; and n represents 0 or 1. In this connection, there is no case wherein R2 is a methyl group, Z is CH2 and n is 1 in general formula (A-1).)
Inventors:
NAKAYAMA OSAMU (JP)
Application Number:
PCT/JP2012/050981
Publication Date:
August 09, 2012
Filing Date:
January 18, 2012
Export Citation:
Assignee:
KURARAY CO (JP)
NAKAYAMA OSAMU (JP)
NAKAYAMA OSAMU (JP)
International Classes:
C08F20/36; C07C271/34; C07D309/32; G03F7/039; H01L21/027
Foreign References:
| JP2011232632A | 2011-11-17 | |||
| JP2011209667A | 2011-10-20 | |||
| JP2007106929A | 2007-04-26 | |||
| JP2010224558A | 2010-10-07 | |||
| JP2009063610A | 2009-03-26 |
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Claims: