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Title:
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/200179
Kind Code:
A1
Abstract:
The present invention provides an actinic-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin which increases in polarity by the action of an acid and (B) a compound which generates an acid upon irradiation with actinic rays or radiation and which is represented by a specific general formula, wherein the resin (A) includes repeating units represented by a specific general formula. Also provided are: an actinic-ray-sensitive or radiation-sensitive film formed from the actinic-ray-sensitive or radiation-sensitive resin composition; a method for forming a pattern; and a method for producing an electronic device.

Inventors:
MIYOSHI TARO (JP)
FUKUZAKI EIJI (JP)
Application Number:
PCT/JP2021/010955
Publication Date:
October 07, 2021
Filing Date:
March 17, 2021
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
C07C309/09; C07C309/12; C07C309/17; C07C309/58; C07C311/24; C07C311/48; C07C311/51; C07C317/24; C07C317/44; C07C381/12; C07D307/00; C07D309/12; C07D309/30; C07D327/06; C07D327/08; C07D333/46; C07D333/76; C07D335/02; C07J9/00; C08F12/24; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
WO2020158366A12020-08-06
Foreign References:
JP2019014704A2019-01-31
JP2014149409A2014-08-21
Attorney, Agent or Firm:
KOH-EI PATENT FIRM, P.C. (JP)
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