Title:
ACTIVE ENERGY RAY-CURABLE COMPOSITION AND ANTISTATIC FILM
Document Type and Number:
WIPO Patent Application WO/2016/052140
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing an active energy ray-curable composition that has good antistatic properties, scratch resistance, and transparency after curing and an antistatic film using same. This active energy ray-curable composition comprises a photopolymerization initiator A represented by formula (I), an antistatic polymer B, and a polymerizable compound C containing an ethylenically unsaturated group. In formula (I), V1, V2, V3, and V4 each independently represent a hydrogen atom or a substituent and n represents an integer of 1-5.
More Like This:
Inventors:
YAMASHITA MASAKO (JP)
Application Number:
PCT/JP2015/075826
Publication Date:
April 07, 2016
Filing Date:
September 11, 2015
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F2/44; C08F265/06; C08F299/06; C08J7/044; C08J7/046
Foreign References:
JP2008247939A | 2008-10-16 | |||
JP2007137964A | 2007-06-07 | |||
JP2009053445A | 2009-03-12 | |||
JPH10330317A | 1998-12-15 | |||
JP2000186243A | 2000-07-04 | |||
JP2006342213A | 2006-12-21 | |||
JPH0673305A | 1994-03-15 | |||
JP2010116505A | 2010-05-27 | |||
JP2015025076A | 2015-02-05 |
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
Mochitoshi Watanabe (JP)
Mochitoshi Watanabe (JP)
Download PDF:
Previous Patent: RESIN COMPOSITION FOR FORMING HYDROPHILIC COATING FILM
Next Patent: ACTIVE ENERGY RAY-CURABLE COMPOSITION AND ANTISTATIC FILM
Next Patent: ACTIVE ENERGY RAY-CURABLE COMPOSITION AND ANTISTATIC FILM