Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/065450
Kind Code:
A1
Abstract:
An active light sensitive or radiation sensitive resin composition which contains (A) an acid-decomposable resin, (B) a compound represented by general formula (b1), and (C) a compound represented by general formula (c1), wherein the ratio of the content of the compound (C) to the content of the compound (B) is from 0.01% by mass to 10% by mass; an active light sensitive or radiation sensitive film which uses this active light sensitive or radiation sensitive resin composition; a pattern forming method; and a method for producing an electronic device. In the formulae, L1 represents a single bond or a divalent linking group; A represents a group that is decomposed by the action of an acid; each B represents a group that is decomposed by the action of an acid, a hydroxy group or a carboxy group, provided that at least one B represents a hydroxy group or a carboxy group; n represents an integer from 1 or 5; X represents an (n+1)-valent linking group; and M+ represents a sulfonium ion or an iodonium ion.

Inventors:
MIYOSHI TARO (JP)
YONEKUTA YASUNORI (JP)
FUKUZAKI EIJI (JP)
TAKAHASHI TOSHIYA (JP)
Application Number:
PCT/JP2020/034762
Publication Date:
April 08, 2021
Filing Date:
September 14, 2020
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIFILM CORP (JP)
International Classes:
C07C25/02; C07C43/225; C07C309/12; C07C309/22; C07C309/42; C07C309/58; C07C381/12; C08F12/24; C08F20/16; C08F20/58; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
WO2013140969A12013-09-26
Foreign References:
JP2018005224A2018-01-11
JP2012224586A2012-11-15
JP2018012684A2018-01-25
JP2011164322A2011-08-25
JP2013250433A2013-12-12
JP2013041257A2013-02-28
US20160274458A12016-09-22
US20150004544A12015-01-01
US20160147150A12016-05-26
JPH06184170A1994-07-05
JPH06184170A1994-07-05
US20160070167A12016-03-10
US20160237190A12016-08-18
US20120135348A12012-05-31
US20150309408A12015-10-29
US20080248425A12008-10-09
JP2002090991A2002-03-27
JP2014059543A2014-04-03
JP2013061648A2013-04-04
JP2013061647A2013-04-04
US20130244438A12013-09-19
JP2014056194A2014-03-27
JP2002062667A2002-02-28
JPS6236663A1987-02-17
JPS6236663A1987-02-17
JPS61226746A1986-10-08
JPS61226746A1986-10-08
JPS61226745A1986-10-08
JPS61226745A1986-10-08
JPS62170950A1987-07-28
JPS62170950A1987-07-28
JPS6334540A1988-02-15
JPS6334540A1988-02-15
JPH07230165A1995-08-29
JPH07230165A1995-08-29
JPH0862834A1996-03-08
JPH0862834A1996-03-08
JPH0954432A1997-02-25
JPH0954432A1997-02-25
JPH095988A1997-01-10
JPH095988A1997-01-10
US5405720A1995-04-11
US5360692A1994-11-01
US5529881A1996-06-25
US5296330A1994-03-22
US5436098A1995-07-25
US5576143A1996-11-19
US5294511A1994-03-15
US5824451A1998-10-20
JP2015216403A2015-12-03
JP2008292975A2008-12-04
JPH1121393A1999-01-26
JPH1121393A1999-01-26
JPH1045961A1998-02-17
JPH1045961A1998-02-17
JP2019179944A2019-10-17
JP2020094650A2020-06-18
Other References:
"Chemical Handbook", vol. II, 1993, CHEMICAL SOCIETY OF JAPAN, MARUZEN COMPANY, LTD.
ELMAR PLATZGUMMERSTEFAN CERNUSCACHRISTOF KLEINJAN KLIKOVITSSAMUEL KVASNICAHANS LOESCHNER: "eMET - 50 keV electron Mask Exposure Tool Development based on proven multi-beam projection technology", PROC. SPIE, vol. 7823, 2010, pages 782308, XP055099481, DOI: 10.1117/12.864261
CHRISTOF KLEINHANS LOESCHNERELMAR PLATZGUMMER: "Performance of the Proof-of-Concept Multi-Beam Mask Writer", PRO. SPIE, vol. 8880, 2013, pages 88801E
See also references of EP 4039669A4
Attorney, Agent or Firm:
KOH-EI PATENT FIRM, P.C. (JP)
Download PDF: