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Patent Searching and Data


Title:
ANTI-GLARE FILM, METHOD FOR PRODUCING SAME AND USE OF SAME
Document Type and Number:
WIPO Patent Application WO/2021/014776
Kind Code:
A1
Abstract:
According to the present invention, an anti-glare film containing an anti-glare layer, at least one surface of which is a relief surface having a relief pattern, is prepared; and the anti-glare layer satisfies all of the characteristics (1) to (5) described below. (1) The haze is from 1% to 60%. (2) The internal haze is from 1% to 50%. (3) The gloss at 60° of the relief surface is from 0.1% to 70%. (4) The average length RSm of roughness curve elements of the relief surface is from 1 μm to 50 μm. (5) The skewness Rsk of the relief surface is less than 0. The anti-glare layer may contain particles and a photocurable resin. This anti-glare film may be produced through a transfer process wherein a transfer surface of a transfer film is used as a mold, and a relief pattern, which is a reversal pattern of the transfer surface, is formed on a transfer-receiving surface of an anti-glare film precursor. This anti-glare film is able to achieve a good balance between anti-glare properties and dazzling resistance.

Inventors:
ONOMICHI HIROSHI (JP)
Application Number:
PCT/JP2020/021908
Publication Date:
January 28, 2021
Filing Date:
June 03, 2020
Export Citation:
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Assignee:
DAICEL CORP (JP)
International Classes:
G02B5/02; G02F1/1333; G09F9/00; H01L27/32; H01L51/50; H05B33/02
Domestic Patent References:
WO2017043538A12017-03-16
WO2019070074A12019-04-11
Foreign References:
JP2017159649A2017-09-14
JP2018173546A2018-11-08
JP2018063419A2018-04-19
JP2018198050A2018-12-13
JP2017047597A2017-03-09
Attorney, Agent or Firm:
KUWATA Mitsuo et al. (JP)
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