Title:
APPARATUS FOR HIGH TEMPERATURE GAS, INCLUDING THREE-DIMENSIONAL LATTICE STRUCTURE, AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2022/145859
Kind Code:
A1
Abstract:
An apparatus for high temperature gas, including a three-dimensional lattice structure, according to the present invention comprises at least one partition wall, wherein different three-dimensional lattice structures are included in different spaces within the partition wall.
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| WO/2021/188232 | MECHANISM FOR VARIABLE THERMAL CONDUCTANCE |
Inventors:
KIM SEOK HO (KR)
KIM SEOK (KR)
KIM BYUNG HUI (KR)
KIM SEOK (KR)
KIM BYUNG HUI (KR)
Application Number:
PCT/KR2021/019572
Publication Date:
July 07, 2022
Filing Date:
December 22, 2021
Export Citation:
Assignee:
NAT UNIV CHANGWON IND ACADEMY COOP CORPS (KR)
International Classes:
F28F13/00; B33Y80/00; C09D5/00; F28F1/40
Domestic Patent References:
| WO2019037931A1 | 2019-02-28 | |||
| WO2020122886A1 | 2020-06-18 |
Foreign References:
| US10570746B2 | 2020-02-25 | |||
| CN209080154U | 2019-07-09 | |||
| US9920530B2 | 2018-03-20 |
Attorney, Agent or Firm:
KIM, Youn Gwon (KR)
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