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Patent Searching and Data


Title:
ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2021/232532
Kind Code:
A1
Abstract:
Disclosed are an array substrate and a method for manufacturing same. The array substrate comprises: an active layer (500) and a source-drain layer, wherein the active layer (500) is patterned to form a channel region; the source-drain layer comprises a first source-drain layer (710) and a second source-drain layer (720), which are laminated; the first source-drain layer (710) forms a doped region in a region in which the first source-drain layer is in contact with the active layer (500); and the material of the first source-drain layer (710) is the same as the material of the active layer (500), both of which are a semiconductor material, but ion doping concentrations of the two are different.

Inventors:
ZHANG, Weibin (CN)
Application Number:
PCT/CN2020/097896
Publication Date:
November 25, 2021
Filing Date:
June 24, 2020
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD. (CN)
International Classes:
H01L27/12; H01L27/32; H01L21/84
Attorney, Agent or Firm:
PURPLEVINE INTELLECTUAL PROPERTY (SHENZHEN) CO., LTD. (CN)
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