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Patent Searching and Data


Title:
ARTIFICIAL NAIL REMOVAL LIQUID, ARTIFICIAL NAIL REMOVAL METHOD, AND NAIL ART KIT
Document Type and Number:
WIPO Patent Application WO/2015/152211
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide an artificial nail removal liquid that shortens removal time, to provide an artificial nail removal method that uses the artificial nail removal liquid, and to provide a nail art kit. According to the present invention, an artificial nail removal liquid is characterized by containing an acid compound as a component (A), a compound that has a hydroxyl group as a component (B), and water as a component (C). The pH of the artificial nail removal liquid is preferably 1-5. The artificial nail removal liquid preferably contains an organic acid as the component (A) and preferably contains a compound that has a hydroxyl value of 5 mmol/g or more as the component (B). According to the present invention, an artificial nail is preferably formed from an artificial nail composition that contains at least one compound selected from the group that comprises a urethane polymer, a polymer that has an amino group, and a monomer that has an amino group.

Inventors:
TAKANASHI GENKI (JP)
OCHIMIZU TOMOKI (JP)
Application Number:
PCT/JP2015/060071
Publication Date:
October 08, 2015
Filing Date:
March 31, 2015
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
A61K8/365; A45D29/18; A45D31/00; A61K8/34; A61Q3/04
Domestic Patent References:
WO2011016531A12011-02-10
Foreign References:
JPS62155206A1987-07-10
US5342536A1994-08-30
JP2013241362A2013-12-05
JP2009126833A2009-06-11
US20120252710A12012-10-04
Attorney, Agent or Firm:
NOGUCHI YASUHIRO (JP)
Takahiro Noguchi (JP)
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