Title:
BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2010/113813
Kind Code:
A1
Abstract:
Disclosed are: a base-generating agent which has a high sensitivity and a wide application range; and a photosensitive resin composition which has a wide range of application choices owing to the structure of a polymer precursor the reaction of which to give a final product is promoted by a basic substance or by heating in the presence of a basic substance.
A base generating agent represented by chemical formula (1) [wherein each symbol is as defined in the description], characterized by generating a base upon electromagnetic irradiation and heating; and a photosensitive resin composition characterized by comprising said base generating agent and a polymer precursor the reaction of which to give a final product is promoted by said base generating agent and a basic substance or by heating in the presence of the basic substance.
Inventors:
KATAYAMA MAMI (JP)
FUKUDA SHUNJI (JP)
SAKAYORI KATSUYA (JP)
KAWAGUCHI KOUJI (JP)
FUKUDA SHUNJI (JP)
SAKAYORI KATSUYA (JP)
KAWAGUCHI KOUJI (JP)
Application Number:
PCT/JP2010/055431
Publication Date:
October 07, 2010
Filing Date:
March 26, 2010
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
KATAYAMA MAMI (JP)
FUKUDA SHUNJI (JP)
SAKAYORI KATSUYA (JP)
KAWAGUCHI KOUJI (JP)
KATAYAMA MAMI (JP)
FUKUDA SHUNJI (JP)
SAKAYORI KATSUYA (JP)
KAWAGUCHI KOUJI (JP)
International Classes:
C09K3/00; C07D295/18; C07D309/12; C07D317/64; C08K5/04; C08L101/00; C09D7/63; C09D11/00; C09D201/00; C09J11/06; C09J179/04; C09J179/08; C09J201/00; C09J201/02; G03F7/004; G03F7/038
Domestic Patent References:
| WO2009123122A1 | 2009-10-08 |
Foreign References:
| JP2009080452A | 2009-04-16 |
Other References:
WANG, BINGHE: "A photo-sensitive protecting group for amines based on coumarin chemistry", CHEMICAL AND PHARMACEUTICAL BULLETIN, vol. 45, no. 4, 1997, pages 715 - 718
FUKUDA, SHUNJI: "Photosensitive Polyimide using a Highly Sensitive Photobase Generator", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 22, no. 3, 2009, pages 391 - 392
FUKUDA, SHUNJI: "Photosensitive Polyimide using a Highly Sensitive Photobase Generator", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 22, no. 3, 2009, pages 391 - 392
Attorney, Agent or Firm:
KISHIMOTO, Tatsuhito et al. (JP)
Kishimoto Expert (JP)
Kishimoto Expert (JP)
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