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Title:
BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2010/113813
Kind Code:
A1
Abstract:
Disclosed are: a base-generating agent which has a high sensitivity and a wide application range; and a photosensitive resin composition which has a wide range of application choices owing to the structure of a polymer precursor the reaction of which to give a final product is promoted by a basic substance or by heating in the presence of a basic substance. A base generating agent represented by chemical formula (1) [wherein each symbol is as defined in the description], characterized by generating a base upon electromagnetic irradiation and heating; and a photosensitive resin composition characterized by comprising said base generating agent and a polymer precursor the reaction of which to give a final product is promoted by said base generating agent and a basic substance or by heating in the presence of the basic substance.

Inventors:
KATAYAMA MAMI (JP)
FUKUDA SHUNJI (JP)
SAKAYORI KATSUYA (JP)
KAWAGUCHI KOUJI (JP)
Application Number:
PCT/JP2010/055431
Publication Date:
October 07, 2010
Filing Date:
March 26, 2010
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD (JP)
KATAYAMA MAMI (JP)
FUKUDA SHUNJI (JP)
SAKAYORI KATSUYA (JP)
KAWAGUCHI KOUJI (JP)
International Classes:
C09K3/00; C07D295/18; C07D309/12; C07D317/64; C08K5/04; C08L101/00; C09D7/63; C09D11/00; C09D201/00; C09J11/06; C09J179/04; C09J179/08; C09J201/00; C09J201/02; G03F7/004; G03F7/038
Domestic Patent References:
WO2009123122A12009-10-08
Foreign References:
JP2009080452A2009-04-16
Other References:
WANG, BINGHE: "A photo-sensitive protecting group for amines based on coumarin chemistry", CHEMICAL AND PHARMACEUTICAL BULLETIN, vol. 45, no. 4, 1997, pages 715 - 718
FUKUDA, SHUNJI: "Photosensitive Polyimide using a Highly Sensitive Photobase Generator", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 22, no. 3, 2009, pages 391 - 392
Attorney, Agent or Firm:
KISHIMOTO, Tatsuhito et al. (JP)
Kishimoto Expert (JP)
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