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Patent Searching and Data


Title:
BEAM ADJUSTING METHOD AND BEAM ADJUSTING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/020394
Kind Code:
A1
Abstract:
A beam adjusting device (30) comprises: a first light-emitting element that projects a first laser beam L1; a second light-emitting element that projects a second laser beam L2; an optical system (22) that projects, in the same direction, the first laser beam and the second laser beam in an overlapping manner; a first target (32) that obtains first information pertaining to images of the first laser beam and the second laser beam at a first position P1 on the light path of the optical system; a second target (34) that obtains second information pertaining to images of the first laser beam and the second laser beam at a second position P2 on the light path, which is different from the first position; and an adjusting unit (36) that adjusts the configuration of the optical system on the basis of the first information and the second information so that the first laser beam and the second laser beam are aligned with each other.

Inventors:
MURAKAMI KAZUOMI (JP)
UCHIDA NAOKI (JP)
Application Number:
PCT/JP2020/028892
Publication Date:
February 04, 2021
Filing Date:
July 28, 2020
Export Citation:
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Assignee:
KOITO MFG CO LTD (JP)
International Classes:
G02B3/06; B60Q1/04; B60Q1/06; F21S2/00; G01M11/06; G02B5/20; G03B21/14
Domestic Patent References:
WO2019044374A12019-03-07
Foreign References:
JP2012247529A2012-12-13
JP2011107573A2011-06-02
JPH01251010A1989-10-06
JP2013235742A2013-11-21
JP2014126723A2014-07-07
JP2017228390A2017-12-28
Attorney, Agent or Firm:
MORISHITA Sakaki (JP)
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