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Patent Searching and Data


Title:
BODY OF VALVE FOR ADJUSTING FLOW RATE OF HOT GAS AND METHOD FOR PREPARING THE SAME
Document Type and Number:
WIPO Patent Application WO/2003/037821
Kind Code:
A1
Abstract:
A body of a valve for adjusting the flow rate of a hot gas which is prepared by forming a silicon nitride sintered body consisting substantially of β−Si3N4 phase, Si2N2O phase and Y2Si2O7 phase&semi and a method for preparing the body of a valve. The body of a valve is free from the problems associated with a conventional valve for adjusting the flow rate of a hot gas, is excellent in thermal stability and mechanical stability, and exhibits long−term durability.

Inventors:
MATSUBAYASHI SHIGEHARU (JP)
NOSE TETSURO (JP)
TSUYUKI AKIRA (JP)
Application Number:
PCT/JP2001/009485
Publication Date:
May 08, 2003
Filing Date:
October 29, 2001
Export Citation:
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Assignee:
NIPPON STEEL CORP (JP)
MATSUBAYASHI SHIGEHARU (JP)
NOSE TETSURO (JP)
TSUYUKI AKIRA (JP)
International Classes:
C04B35/584; C04B35/591; F16K1/22; (IPC1-7): C04B35/584
Foreign References:
JP2001311474A2001-11-09
US5114889A1992-05-19
JPH03199165A1991-08-30
Attorney, Agent or Firm:
Ishida, Takashi (ISHIDA & ASSOCIATES Toranomon 37 Mori Bldg., 5-1, Toranomon 3-chom, Minato-ku Tokyo, JP)
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