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Patent Searching and Data


Title:
CHARGED PARTICLE BEAM DEVICE AND INSPECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/065006
Kind Code:
A1
Abstract:
Provided is a charged particle beam device for which deterioration of throughput thereof in the event of a multibeam abnormality can be suppressed. The charged particle beam device has: a stage (11) on which a sample is mounted; a charged particle optical system for irradiating the sample with a multibeam comprising multiple primary beams; a detector (15) for detecting secondary beams generated by interactions of the primary beams with the sample and outputting detection signals; and a control unit (17) for controlling the stage and the charged particle optical system so as to generate image data from detection signals from the detector obtained by scanning the sample with the multibeam using a first scanning method. When a multibeam abnormality is detected from the image data, the control unit changes the multibeam so as to scan the sample using a second scanning method, and the scanning width of the multibeam for scanning the sample is greater in the second scanning method than in the first scanning method.

Inventors:
ENYAMA MOMOYO (JP)
SAKAKIBARA MAKOTO (JP)
KAWANO HAJIME (JP)
Application Number:
PCT/JP2019/039369
Publication Date:
April 08, 2021
Filing Date:
October 04, 2019
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/22
Foreign References:
JP2005116743A2005-04-28
JP2013128032A2013-06-27
JP2015119043A2015-06-25
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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