Title:
CLEAN ROOM SYSTEM FOR SEMICONDUCTOR MANUFACTURING AND ELECTRIC-FIELD DUST REMOVAL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/216356
Kind Code:
A1
Abstract:
Provided are a clean room system (100) for semiconductor manufacturing and an electric-field dust removal method therefor. The clean room system (100) comprises a clean room (101) and an electric-field dust removal system (102); the clean room (101) comprises a gas inlet; the electric-field dust removal system (102) comprises a dust removal system outlet and an electric field apparatus (1021); the gas inlet of the clean room (101) communicates with the dust removal system outlet of the electric-field dust removal system (102); and an electric field cathode (10142, 4052, 5081, 3081) and an electric field anode (10141, 4051, 5082, 3082) of the electric field apparatus (1021) are used to generate an ionizing electric field.
Inventors:
TANG WANFU (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
Application Number:
PCT/CN2020/086851
Publication Date:
October 29, 2020
Filing Date:
April 24, 2020
Export Citation:
Assignee:
SHANGHAI BIXIUFU ENTERPRISE MAN CO LTD (CN)
International Classes:
B03C3/011; B03C3/06; B03C3/34; B03C3/41; B03C3/47; B03C3/49
Foreign References:
| JPS57150457A | 1982-09-17 | |||
| CN106733194A | 2017-05-31 | |||
| JPH028638A | 1990-01-12 | |||
| CN205518205U | 2016-08-31 | |||
| CN206980986U | 2018-02-09 | |||
| CN203108663U | 2013-08-07 |
Attorney, Agent or Firm:
SHANGHAI QIHE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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