Title:
CLEANING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/100626
Kind Code:
A1
Abstract:
According to the present invention, a jig 6 holds a plurality of light-emitting bars with gaps therebetween so that a space Sp1 is present under opposite surfaces X1b of the plurality of light-emitting bars that are objects X1 to be cleaned. A cleaning nozzle 21 sprays particulate dry ice 2 onto cleaning surfaces X1a of the plurality of light-emitting bars. Gaps G1 are present between the plurality of light-emitting bars. A dust collecting part 30 is provided to the opposite surface X1b side of the plurality of light-emitting bars that are objects X1 to be cleaned.
Inventors:
YAMAKAWA KYOHEI (JP)
TAKIMOTO SHINSUKE (JP)
YOSHIKAWA KENJI (JP)
SUZUKI MASATO (JP)
YOSHINO TATSURO (JP)
TAKIMOTO SHINSUKE (JP)
YOSHIKAWA KENJI (JP)
SUZUKI MASATO (JP)
YOSHINO TATSURO (JP)
Application Number:
PCT/JP2020/042419
Publication Date:
May 27, 2021
Filing Date:
November 13, 2020
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
B08B5/00; B08B5/02; H01L21/304
Foreign References:
| JP2002093763A | 2002-03-29 | |||
| JP2004103991A | 2004-04-02 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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