Title:
CLEANING METHOD, CLEANING MECHANISM, AND RAW MATERIAL SUPPLY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2021/260980
Kind Code:
A1
Abstract:
A method for cleaning a nozzle and portions close to the nozzle of a device that sprays a solution obtained by dissolving a solid raw material in a solvent, or a slurry or sol obtained by dispersing a solid raw material in a solvent, into a pressure-reduced container through the nozzle, so that the solvent is vaporized and removed from the solution or the slurry or sol in the container, the method comprising: adjusting the pressure in the container so as to be changed from the pressure applied when the solvent is vaporized; and supplying a cleaning liquid to the nozzle and thereby cleaning the nozzle and portions close to the nozzle.
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Inventors:
KOMORI EIICHI (JP)
Application Number:
PCT/JP2021/001017
Publication Date:
December 30, 2021
Filing Date:
January 14, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
B08B3/08; C23C16/44; B08B9/032
Foreign References:
| JPH05253404A | 1993-10-05 | |||
| JP2010078232A | 2010-04-08 | |||
| JPH0731101U | 1995-06-13 | |||
| JP2003282449A | 2003-10-03 | |||
| JP2005256107A | 2005-09-22 |
Attorney, Agent or Firm:
TAKAYAMA Hiroshi (JP)
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