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Patent Searching and Data


Title:
CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/239912
Kind Code:
A1
Abstract:
Provided is a method for cleaning a microwave plasma treatment apparatus which has a treatment container and a microwave radiation part and which has a window formed at the position in the treatment container where the microwave radiation part is disposed, the method comprising a cleaning step for, while a cleaning gas is supplied, adjusting the pressure thereof in accordance with the size of a part to be cleaned among parts that are located inside the treatment container and that include the window, the microwave radiation part, and wall surfaces of the treatment container, and for cleaning the part using plasma of the cleaning gas.

Inventors:
ITOH SATOSHI (JP)
NOGAMI TAKAFUMI (JP)
YOKOKURA EITA (JP)
MATSUMOTO REISA (JP)
Application Number:
PCT/JP2019/021541
Publication Date:
December 19, 2019
Filing Date:
May 30, 2019
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/31; C23C16/44; C23C16/511; H01L21/3065; H05H1/46
Domestic Patent References:
WO2013092770A12013-06-27
Foreign References:
JP2013102048A2013-05-23
JP2011077442A2011-04-14
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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