Title:
COATING COMPOSITION AND LOW DIELECTRIC POROUS SILICEOUS MATERIAL PRODUCED BY USING SAME
Document Type and Number:
WIPO Patent Application WO/2005/014744
Kind Code:
A1
Abstract:
Disclosed is a coating composition which enables to produce a porous siliceous film which exhibits excellent mechanical strength, stably very low dielectric constant, and chemical resistance to various chemicals at the same time. Also disclosed is a method for producing a siliceous material using such a coating composition. The coating composition contains a polyalkyl silazane compound, a siloxy group-containing polymer and an organic solvent. Also disclosed are a siliceous material obtained by firing such a coating composition and a method for producing such a siliceous material.
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Inventors:
AOKI TOMOKO (JP)
AOKI HIROYUKI (JP)
AOKI HIROYUKI (JP)
Application Number:
PCT/JP2004/011136
Publication Date:
February 17, 2005
Filing Date:
August 04, 2004
Export Citation:
Assignee:
CLARIANT INT LTD (CH)
AOKI TOMOKO (JP)
AOKI HIROYUKI (JP)
AOKI TOMOKO (JP)
AOKI HIROYUKI (JP)
International Classes:
C09D143/04; C09D183/16; H01L21/312; (IPC1-7): C09D183/16; C09D143/04; C09D171/00; C09D183/04; C01B33/12; H01L21/312
Foreign References:
JPH07292321A | 1995-11-07 | |||
JPH0673340A | 1994-03-15 | |||
JPH11236533A | 1999-08-31 | |||
JP2002075982A | 2002-03-15 |
Attorney, Agent or Firm:
Yoshitake, Kenji (Room 323 Fuji Bldg., 2-3, Marunouchi 3-chom, Chiyoda-ku Tokyo 05, JP)
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