Title:
COMPOSITION FOR DEPOSITION OF SILICON-CONTAINING THIN FILM, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM BY USING SAME
Document Type and Number:
WIPO Patent Application WO/2019/103500
Kind Code:
A1
Abstract:
The present invention relates to: a composition for deposition of a silicon-containing thin film, comprising a trisilylamine compound; and a method for manufacturing a silicon-containing thin film by using the same and, more specifically, provides: a composition for deposition of a silicon-containing thin film, comprising a trisilylamine compound, which is capable of forming a silicon-containing thin film at a very excellent deposition rate at a low temperature, so as to be effectively usable as a precursor of a silicon-containing thin film and a display packaging material; and a method for manufacturing a silicon-containing thin film by using the same.
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Inventors:
KIM SUNG GI (KR)
PARK JOONG JIN (KR)
YANG BYEONG-IL (KR)
JANG SE JIN (KR)
PARK GUN-JOO (KR)
PARK JEONG JOO (KR)
JEONG HEE YEON (KR)
LEE SAM DONG (KR)
LEE SANG ICK (KR)
KIM MYONG WOON (KR)
PARK JOONG JIN (KR)
YANG BYEONG-IL (KR)
JANG SE JIN (KR)
PARK GUN-JOO (KR)
PARK JEONG JOO (KR)
JEONG HEE YEON (KR)
LEE SAM DONG (KR)
LEE SANG ICK (KR)
KIM MYONG WOON (KR)
Application Number:
PCT/KR2018/014474
Publication Date:
May 31, 2019
Filing Date:
November 22, 2018
Export Citation:
Assignee:
DNF CO LTD (KR)
International Classes:
C23C16/30; C07F7/10; C23C16/32; C23C16/34; C23C16/40; C23C16/455; C23C16/50
Foreign References:
KR20170124108A | 2017-11-09 | |||
KR20170045138A | 2017-04-26 | |||
KR20140143681A | 2014-12-17 | |||
KR20170058957A | 2017-05-29 | |||
KR20140143682A | 2014-12-17 |
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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