Title:
COMPOSITION, FILM, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING PATTERNED SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/049795
Kind Code:
A1
Abstract:
The purpose of the invention is to provide: a composition capable of forming a film exhibiting excellent flatness, wet peeling resistance, and pattern bending resistance while maintaining solvent resistance; a film; a method for forming a film; and a method for producing a patterned substrate. The present invention pertains to a composition containing a solvent and a compound having a group represented by formula (1), having a molecular weight of at least 200, and having a carbon atom content of at least 40 mass%. In formula (1), R1 and R2 are each independently a hydrogen atom, a fluorine atom, a C1-20 monovalent hydrocarbon group or C1-20 monovalent fluorinated hydrocarbon group, or a portion of an alicyclic structure which has 3-20 ring members and in which these groups are combined with each other together with carbon atoms bonded to these groups. Ar1 is a group obtained by removing (n+3) hydrogen atoms from an arene or heteroarene having 6-20 ring members. X is an oxygen atom, -CR3R4-, -CR3R4-O- or -O-CR3R4-.
Inventors:
NAKATSU HIROKI (JP)
TAKANASHI KAZUNORI (JP)
SAKAI KAZUNORI (JP)
MATSUMURA YUUSHI (JP)
NAKAGAWA HIROKI (JP)
TAKANASHI KAZUNORI (JP)
SAKAI KAZUNORI (JP)
MATSUMURA YUUSHI (JP)
NAKAGAWA HIROKI (JP)
Application Number:
PCT/JP2018/032434
Publication Date:
March 14, 2019
Filing Date:
August 31, 2018
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C09D201/02; C07D317/46; C07D317/54; C07D317/64; C07D405/14; C08L101/06; C09D5/00; G03F7/11; G03F7/20; G03F7/26
Domestic Patent References:
| WO2014115843A1 | 2014-07-31 |
Foreign References:
| JP2001215727A | 2001-08-10 | |||
| JP2013167669A | 2013-08-29 | |||
| JP2013041140A | 2013-02-28 | |||
| JP2012098520A | 2012-05-24 | |||
| JP2011068888A | 2011-04-07 | |||
| JP2017097240A | 2017-06-01 |
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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