Title:
COMPOSITION FOR FORMING RELEASE LAYER FOR SLIT DIE COATING, AND RELEASE LAYER
Document Type and Number:
WIPO Patent Application WO/2020/158521
Kind Code:
A1
Abstract:
The present invention provides a composition for forming a release layer for slit die coating, which contains (A) a polyurea that contains a repeating unit represented by formula (1), (B) an acid compound or a salt thereof, (C) a crosslinking agent that is selected from among compounds having nitrogen atoms which are substituted by a hydroxyalkyl group and/or an alkoxymethyl group, (D) a polymer additive which contains a repeating unit represented by formula (a1), a repeating unit represented by formula (b) and a repeating unit represented by formula (c), and (E) a solvent that contains at least one solvent which has a vapor pressure of 800 Pa or less at 20°C; and this composition is configured such that 3-100 parts by mass of the polymer additive (D) is contained per 100 parts by mass of the polyurea (A).
Inventors:
SHINDO KAZUYA (JP)
EBARA KAZUYA (JP)
EBARA KAZUYA (JP)
Application Number:
PCT/JP2020/002014
Publication Date:
August 06, 2020
Filing Date:
January 22, 2020
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
B05D1/26; B05D5/00; B32B27/00; B32B37/26; C08G73/06; C08K5/42; C08L33/16; C08L79/04; C09D179/04
Domestic Patent References:
| WO2015012172A1 | 2015-01-29 | |||
| WO2019022185A1 | 2019-01-31 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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