COMPOSITION FOR FORMING THIN METAL OXIDE FILM

Title:

COMPOSITION FOR FORMING THIN METAL OXIDE FILM

Document Type and Number:

WIPO Patent Application WO/2001/068529

Kind Code:

A1

Abstract:

A composition from which a thin metal oxide film containing zirconium oxide as the main component can be easily formed on a surface of a substrate. The composition comprises a zirconium ingredient and one or more ingredients of a metal other than zirconium. The zirconium ingredient is a salt of an amine with a zirconium complex or zirconium salt formed from an aminopolycarboxylic acid and a zirconium compound. The ingredients of a metal other than zirconium are compounds of a metal other than zirconium. In the composition, the proportion of the zirconium ingredient is 70 to 98 mol% in terms of zirconium oxide and that of the ingredients of a metal other than zirconium is 2 to 30 mol% in terms of the oxide of the metal, based on all the metal ingredients. By using the composition, a member having a thin metal oxide film excellent in chemical stability, thermal stability, and mechanical strength is obtained.

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Inventors:

SATOH MITSUNOBU (JP)
NISHIDE TOSHIKAZU (JP)
OTSUKI TETSUYA (JP)
YANAGIHARA TAE (JP)
SAKASHITA YOSHIAKI (JP)

Application Number:

PCT/JP2001/001699

Publication Date:

September 20, 2001

Filing Date:

March 05, 2001

Export Citation:

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Assignee:

TEIKOKU CHEMICAL IND CO LTD (JP)
NAGASE & CO LTD (JP)
SATOH MITSUNOBU (JP)
NISHIDE TOSHIKAZU (JP)
OTSUKI TETSUYA (JP)
YANAGIHARA TAE (JP)
SAKASHITA YOSHIAKI (JP)

International Classes:

C01G25/02; (IPC1-7): C01G25/00

Foreign References:

JPH11228113A	1999-08-24
JPH02212308A	1990-08-23
JPH09278489A	1997-10-28

Attorney, Agent or Firm:

Nanjo, Hiromichi (Okina Bldg. 2-9, Nishitenma 3-chome Kita-ku Osaka-shi Osaka, JP)

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