Title:
COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER
Document Type and Number:
WIPO Patent Application WO/2021/205885
Kind Code:
A1
Abstract:
The present invention provides a composition which is suppressed in decrease of the etching rate over time. A composition which contains: at least one of a quaternary alkyl ammonium fluoride and a hydrate of a quaternary alkyl ammonium fluoride; (A) an N-substituted amide compound that has no active hydrogen on a nitrogen atom and (B) a dipropylene glycol dimethyl ether, which serve as aprotic solvents; and an antioxidant.
Inventors:
HAYASHI KOTARO (JP)
NAKAZAKI SUSUMU (JP)
NAKAZAKI SUSUMU (JP)
Application Number:
PCT/JP2021/012376
Publication Date:
October 14, 2021
Filing Date:
March 24, 2021
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
International Classes:
B08B3/08; C11D7/28; C11D7/50; H01L21/304
Domestic Patent References:
| WO2018043690A1 | 2018-03-08 |
Foreign References:
| US20030148904A1 | 2003-08-07 | |||
| JP2004361433A | 2004-12-24 | |||
| KR20160090624A | 2016-08-01 | |||
| US20180265819A1 | 2018-09-20 | |||
| JP2004000969A | 2004-01-08 |
Attorney, Agent or Firm:
AOKI, Atsushi et al. (JP)
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