Title:
COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME
Document Type and Number:
WIPO Patent Application WO/2018/074382
Kind Code:
A1
Abstract:
Provided are an onium salt and a composition which are appropriately usable in a resist composition for a lithography process, wherein two kinds of active energy rays including first active energy rays such as electron beams or extreme ultraviolet rays and second active energy rays such as UV are used, and which are highly sensitive and have excellent pattern characteristics such as LWR. According to the present invention, an onium salt represented by one formula selected from among general formula (1), general formula (2), general formula (11) and general formula (12) is provided.
Inventors:
SUGA YUSUKE (JP)
ENOMOTO SATOSHI (JP)
ENOMOTO SATOSHI (JP)
Application Number:
PCT/JP2017/037266
Publication Date:
April 26, 2018
Filing Date:
October 13, 2017
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C07C381/12; C07C43/315; C07D317/22; C07D333/76; C09K3/00; G03F7/004; G03F7/039; G03F7/38
Domestic Patent References:
| WO2016133073A1 | 2016-08-25 |
Foreign References:
| JP2015172741A | 2015-10-01 |
Other References:
MARUCCI, GABRIELLA ET AL.: "SYNTHESIS AND ANTIMUSCARINIC ACTIVITY OF DERIVATIVES OF 2- SUBSTITUTED-1,3-DIOXOLANES", MEDICINAL CHEMISTRY RESEARCH, vol. 14, no. 5, 2005, pages 274 - 296, XP019428171, ISSN: 1054-2523
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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